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Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy: Difference between revisions

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==Comparison of the SEM's at CEN==
{|border="1" cellspacing="1" cellpadding="3" style="text-align:left;"
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|-style="background:silver; color:black"
!
![[Specific Process Knowledge/Characterization/SEM1|SEM1]]
![[Specific Process Knowledge/Characterization/SEM2|SEM2]]
![[Specific Process Knowledge/Characterization/SEM3|SEM3]]
![[Specific Process Knowledge/Characterization/SEM4|SEM4]]
![[Specific Process Knowledge/Characterization/SEM5|SEM5]]
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|-style="background:WhiteSmoke; color:black"
!Generel description
|Generel description - method 1
|Generel description - method 2
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|-style="background:LightGrey; color:black"
!Parameter 1
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*A
*B
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*A
*B
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|-style="background:WhiteSmoke; color:black"
!Parameter 2
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*A
*B
*C
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*A
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|-style="background:LightGrey; color:black"
!Substrate size
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*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
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*<nowiki>#</nowiki> small samples
*<nowiki>#</nowiki> 50 mm wafers
*<nowiki>#</nowiki> 100 mm wafers
*<nowiki>#</nowiki> 150 mm wafers
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|-
|-style="background:WhiteSmoke; color:black"
!'''Allowed materials'''
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*Allowed material 1
*Allowed material 2
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*Allowed material 1
*Allowed material 2
*Allowed material 3
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|}
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