Specific Process Knowledge/Lithography: Difference between revisions
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*~1.25 µm and up | *~1.25 µm and up | ||
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*pattern type, shape and pitch dependent | |||
*~200 nm and up | *~200 nm and up | ||
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| Line 45: | Line 45: | ||
*~1.25 µm and up | *~1.25 µm and up | ||
| | | | ||
*pattern type, shape and pitch dependent | |||
*~200 nm and up | *~200 nm and up | ||
| | | | ||