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Specific Process Knowledge/Lithography: Difference between revisions

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Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,531 edits
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'''<big>Manuals</big>'''
*Automatic Spin Coater:
*Manual Spin Coater:
*UV Mask Aligner:
*Automatic Puddle Developer:
*Manual Puddle Developer:
'''<big>Process Flows</big>'''
*[[:Media:Process_Flow_TPT first print.pdf|TPT first print process flow]]
*[[:Media:Process_Flow_TPT alignment.pdf|TPT alignment process flow]]


'''<big>Slides from Lecture</big>'''
'''<big>Slides from Lecture</big>'''
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*[[:Media:Litho_Tool_Package_-_Process_effects_and_examples.pdf|TPT slides: Process Effects and Examples]]
*[[:Media:Litho_Tool_Package_-_Process_effects_and_examples.pdf|TPT slides: Process Effects and Examples]]


 
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'''<big>Process Flows</big>'''
*[[:Media:Process_Flow_TPT first print.pdf|TPT first print process flow]]
*[[:Media:Process_Flow_TPT alignment.pdf|TPT alignment process flow]]
 


'''<big>Resists</big>'''
'''<big>Resists</big>'''
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*[[Specific_Process_Knowledge/Lithography/EBeamLithography#E-beam_resists_and_Process_Flows|E-beam Resist Overview]]
*[[Specific_Process_Knowledge/Lithography/EBeamLithography#E-beam_resists_and_Process_Flows|E-beam Resist Overview]]


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'''<big>UV Exposure</big>'''
'''<big>UV Exposure</big>'''
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