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Specific Process Knowledge/Lithography/UVLithography: Difference between revisions

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|[[media:AZ5214E.pdf‎|AZ5214E.pdf‎]]
|[[media:AZ5214E.pdf‎|AZ5214E.pdf‎]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]],
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]],
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]],


[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or
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|For process with resist thickness between 6 and 25 µm.  
|For process with resist thickness between 6 and 25 µm.  
|[[media:AZ4500.pdf‎|AZ4500.pdf‎]]
|[[media:AZ4500.pdf‎|AZ4500.pdf‎]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]],
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or


[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]]
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]]
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|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]],
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]],


[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]],
[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_E-beam_and_UV|Spin Coater: Gamma e-beam & UV]],


[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or
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|[[media:AZ_nLOF_2020.pdf‎|AZ_nLOF_2020.pdf‎]]
|[[media:AZ_nLOF_2020.pdf‎|AZ_nLOF_2020.pdf‎]]
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]];
|[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_Gamma_UV|Spin Coater: Gamma UV]];
[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]],


[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or
[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spin_Coaters|A manual spin coater]] or