Jump to content

Specific Process Knowledge/Lithography: Difference between revisions

Tigre (talk | contribs)
Tigre (talk | contribs)
Line 276: Line 276:
|-
|-


|}
|-
 
!Course Responsible
 
|
''' Course Responsible:'''
The Lithography Group at DTU Danchip: sign up for the course by emailing to [mailto:lithography@danchip.dtu.dk lithography@danchip.dtu.dk].  
 
|-
The Lithography Group at DTU Danchip: sign up for the course by emailing to lithography@danchip.dtu.dk.  
 
''' Learning Objectives:'''


|-
!Learning Objectives
|
* Describe fundamental parts of lithographic processing in a cleanroom, design of process flows
* Describe fundamental parts of lithographic processing in a cleanroom, design of process flows
* Authorization to use spin coater, mask aligner, and developer at DTU Danchip
* Authorization to use spin coater, mask aligner, and developer at DTU Danchip
* Calculate relevant process parameters
* Calculate relevant process parameters
* Analyze and apply your results of lithographic processing
* Analyze and apply your results of lithographic processing  
|-
 
|}


''' Sign up for the course'''
* send an email to [mailto:lithography@danchip.dtu.dk lithography@danchip.dtu.dk]