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Specific Process Knowledge/Etch/Etching of Polymer: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,317 edits
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![[Specific Process Knowledge/Photolithography/Stripping equipment#Plasma_asher_2|Plasma asher 2]]
![[Specific Process Knowledge/Photolithography/Stripping equipment#Plasma_asher_2|Plasma asher 2]]
![[Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)|RIE2]]
![[Specific Process Knowledge/Etch/RIE (Reactive Ion Etch)|RIE2]]
![[Specific Process Knowledge/Etch/Wet Polymer Etch|Wet Polymer Etch]]
!Wet Polymer stripping
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Almost isotropic to anisotropic (vertical to sample surface)
Almost isotropic to anisotropic (vertical to sample surface)
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Isotropic
Dissolves the polymer
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