Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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<sup>a</sup> | <sup>a</sup> The Raith tool with the attached LEO SEM allow ample freedom in the choice of most parameters. The limits indicated here refer to best cases and may be further constrained by your current selection of microscope and patterning parameters. | ||
<sup>b</sup> For all applicable purposes | <sup>b</sup> For all applicable purposes. | ||
<br clear="all" /> | <br clear="all" /> | ||