Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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|80 <sup>o</sup>C | |80 <sup>o</sup>C | ||
|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!''' | |~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!'''First ad H2SO4 then H2O2 | ||
|- | |- | ||
|'''Process time''' | |'''Process time''' | ||