LabAdviser/Technology Research: Difference between revisions
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==Current Projects== | ==Current Projects== | ||
*[[/Nanoscale Dry Etching - technology Development and Applications|Nanoscale Dry Etching - technology Development and Applications]] | *[[/Nanoscale Dry Etching - technology Development and Applications|Nanoscale Dry Etching - technology Development and Applications]] | ||
*[[/Nanoscale Dry Etching - Technology Development and Applications|Nanoscale Dry Etching - Technology Development and Applications]] | |||
*[[/Frontier Studies of Metal Thin Films - Deposition and Characterization|Frontier Studies of Metal Thin Films - Deposition and Characterization]] | *[[/Frontier Studies of Metal Thin Films - Deposition and Characterization|Frontier Studies of Metal Thin Films - Deposition and Characterization]] | ||
*[[/Ice Lithography for Advanced Nanofabrication|Ice Lithography for Advanced Nanofabrication]] | *[[/Ice Lithography for Advanced Nanofabrication|Ice Lithography for Advanced Nanofabrication]] | ||
Revision as of 14:41, 9 February 2016
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THIS PAGE IS UNDER CONSTRUCTION
This page gives an overview of the technology research going on at DTU Danchip. DTU Danchip will here present the technology research projects that are initiated by DTU Danchip and link them to the process development out come from these projects that are presented else where in LabAdviser. Other technology research activities that are taking place at DTU Danchip but are initiated and performed by DTU institutes or other of our users and collaborators are also very welcome to be presented here. If you are interested in presenting your technology research here then please contact Berit Herstrøm or write to mailto:labadviser@danchip.dtu.dk
Current Projects
- Nanoscale Dry Etching - technology Development and Applications
- Nanoscale Dry Etching - Technology Development and Applications
- Frontier Studies of Metal Thin Films - Deposition and Characterization
- Ice Lithography for Advanced Nanofabrication
- Fabrication of Hyperbolic Metamaterials using Atomic Layer Deposition