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Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions

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|style="background:LightGrey; color:black"|Batch size
|style="background:LightGrey; color:black"|Batch size
|style="background:WhiteSmoke; color:black"|
|style="background:WhiteSmoke; color:black"|
*1-30 4" wafer (or 2" wafers) per run
*1-30 4" wafer (or 2" wafers)  
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|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed
|style="background:silver; color:black"|.|| style="background:LightGrey; color:black"|Substrate material allowed