Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions
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[[Image:C4helstak.jpg |thumb|300x300px|C4 Furnace Aluminium Anneal: positioned in cleanroom 2]] | [[Image:C4helstak.jpg |thumb|300x300px|C4 Furnace Aluminium Anneal: positioned in cleanroom 2]] | ||
C4 Furnace Anneal | C4 Furnace Anneal is a Tempress horizontal furnace for annealing of silicon wafers with Aluminium. | ||
This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. The furnaces are the cleanest process chambers in the cleanroom. In this furnace it is allowed to enter wafers that contains aluminium. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | This furnace is the lowest of the furnace tubes in the furnace C-stack positioned in cleanroom 2. The furnaces are the cleanest process chambers in the cleanroom. In this furnace it is allowed to enter wafers that contains aluminium. Check the cross contamination chart. If you are in doubt, please ask one from the furnace team. | ||