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'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/RIE_(Reactive_Ion_Etch) click here]'''
'''Feedback to this page''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Etch/RIE_(Reactive_Ion_Etch) click here]'''
The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. The minimum electron beam is around 5 nm, the maximum writitng field without stitching is 1 mm x 1 mm.
The machine is located in a class 10 cleanroom (E-2) with tight temperature and moisture control. The room must only be entered when the machines or equipment inside the room is intended to be used.
You can read more about electron beam writing in this book published by [http://www.cnf.cornell.edu/cnf_spietoc.html SPIE].
'''The user manual, technical information and contact information can be found in LabManager and LabAdviser:'''
<!-- remember to remove the type of documents that are not present -->
<!-- give the link to the equipment info page in LabManager: -->
# [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292  E-beam writer in LabManager]
# [[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual|User manual for JBX-9500 e-beam writer on LabAdviser]]
# [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|BEAMER Manual on LabAdviser]]
# [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation|Sdf- and jdf file preparation manual on LabAdviser]]




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= JEOL JBX-9500FSZ =
= JEOL JBX-9500FSZ =
The JEOL JBX-9500 electron beam lithography system is a spot electron beam type lithography system designed for writing patterns with dimensions from nanometers to sub-micrometers. The minimum electron beam is around 5 nm, the maximum writitng field without stitching is 1 mm x 1 mm.
The machine is located in a class 10 cleanroom (E-2) with tight temperature and moisture control. The room must only be entered when the machines or equipment inside the room is intended to be used.
You can read more about electron beam writing in this book published by [http://www.cnf.cornell.edu/cnf_spietoc.html SPIE].
'''The user manual, technical information and contact information can be found in LabManager and LabAdviser:'''
<!-- remember to remove the type of documents that are not present -->
<!-- give the link to the equipment info page in LabManager: -->
# [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292  E-beam writer in LabManager]
# [[Specific_Process_Knowledge/Lithography/EBeamLithography/JBX9500Manual|User manual for JBX-9500 e-beam writer on LabAdviser]]
# [[Specific_Process_Knowledge/Lithography/EBeamLithography/BEAMER|BEAMER Manual on LabAdviser]]
# [[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation|Sdf- and jdf file preparation manual on LabAdviser]]
== Getting started ==
== Getting started ==


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