Specific Process Knowledge/Lithography: Difference between revisions
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*[[Specific Process Knowledge/Lithography/UVExposure#Inclined UV lamp|Inclined UV lamp]] | *[[Specific Process Knowledge/Lithography/UVExposure#Inclined UV lamp|Inclined UV lamp]] | ||
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===[[Specific Process Knowledge/Lithography/UVExposure|Electron Beam Exposure]]=== | |||
*[[Specific Process Knowledge/Lithography/EBeamLithography|E-beam writer]] | |||
===[[Specific Process Knowledge/Lithography/UVExposure|Deep-UV Exposure]]=== | |||
*[[Specific Process Knowledge/Lithography/DUVStepper#DUV Stepper FPA-3000EX4 from Canon|DUV Stepper FPA-3000EX4 from Canon]] | |||
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*[[Specific Process Knowledge/Lithography/LiftOff#LiftOffWetBench|Lift-off Wet Bench]] | *[[Specific Process Knowledge/Lithography/LiftOff#LiftOffWetBench|Lift-off Wet Bench]] | ||
*[[Specific Process Knowledge/Lithography/LiftOff#LiftOff(4",6")|Lift-off (4", 6")]] | *[[Specific Process Knowledge/Lithography/LiftOff#LiftOff(4",6")|Lift-off (4", 6")]] | ||
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*[[Specific Process Knowledge/Lithography/3DLithography#2-Photon Polymerization|2-Photon Polymerization]] | *[[Specific Process Knowledge/Lithography/3DLithography#2-Photon Polymerization|2-Photon Polymerization]] | ||
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= Manuals = | = Manuals = | ||
*[[Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual|User Manual for JEOL JBX-9500 E-beam Writer]] | *[[Specific Process Knowledge/Lithography/EBeamLithography/JBX9500Manual|User Manual for JEOL JBX-9500 E-beam Writer]] | ||