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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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Chasil (talk | contribs)
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|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|1,367
|3,1%
|10/7 2015
|chasil
|with HMDS. Average of 3 wafers


|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|Silicon with native oxide
Line 303: Line 294:
|2,4%
|2,4%
|12/15 2015
|12/15 2015
|chasil
|with HMDS. Average of 3 wafers
|-
|Silicon with native oxide
|1,399
|3,1%
|28/1 2016
|chasil
|chasil
|with HMDS. Average of 3 wafers
|with HMDS. Average of 3 wafers
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