Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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''[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|Coater comparison table]]'' | ''[[Specific_Process_Knowledge/Lithography/Coaters#Coaters:_Comparison_Table|Coater comparison table]]'' | ||
Spin Coater: Gamma UV is a Gamma 2M cluster from Süss MicroTec with spin coating, vapour priming, and baking modules. The system handles 4" and 6" wafers without size conversion, and can be set up to handle 2" or 8". | Spin Coater: Gamma UV was installed at Danchip in March 2015. It is a Gamma 2M cluster from Süss MicroTec with spin coating, vapour priming, and baking modules. The system handles 4" and 6" wafers without size conversion, and can be set up to handle 2" or 8". | ||
The coater is equipped with 3 different resists lines: | The coater is equipped with 3 different resists lines: | ||