Specific Process Knowledge/Etch/KOH Etch: Difference between revisions

Revision as of 16:25, 27 February 2008 view source Fj (talk \| contribs) Bureaucrats, danchip, Administrators 143 edits →KOH etch - ''Anisotropic silicon etch'' ← Older edit		Revision as of 16:34, 27 February 2008 view source Fj (talk \| contribs) Bureaucrats, danchip, Administrators 143 edits →Definition of structures Newer edit →
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	[[Image:KOH_Anisotropy(110).jpg]]		[[Image:KOH_Anisotropy(110).jpg]]

			For Si(100), the relation between the width of the bottom of the etched groove (W<sub>b</sub>) and the width of the opening (W<sub>o</sub>) at the wafer surface is given by: