Jump to content

Specific Process Knowledge/Pattern Design: Difference between revisions

← Older editNewer edit →
VisualWikitext
Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
Kabi (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
1,146 edits
Line 27: Line 27:




For E-beam lithography the layout file has to be saved as a GDS file that is uploaded to the tools computer.  
For E-beam lithography the layout file has to be saved as a GDS file that is uploaded to the equipment computer.  


For laser cutting the layout file has to be saved as a DXF file that is uploaded to the tools computer. For more details see [[Specific_Process_Knowledge/Back-end_processing/Mask_making|Mask Making on the Laser Micro Machining Tool]].
For laser cutting the layout file has to be saved as a DXF file that is uploaded to the equipment computer. For more details see [[Specific_Process_Knowledge/Back-end_processing/Mask_making|Mask Making on the Laser Micro Machining Tool]].


For UV-lithography and DUV-lithography it is necescary to have a physical masks produced based on the layout file. The file format has to be CIF og GDS.
For UV-lithography and DUV-lithography it is necescary to have a physical masks produced based on the layout file. The file format has to be CIF og GDS.
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Pattern_Design"