Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300/IBE Ti etch: Difference between revisions
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*+-(0.8% +-0.5%) | *+-(0.8% +-0.5%) | ||
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!style="background:silver; color:black" align="left" valign="top"|Selectivity ( | !style="background:silver; color:black" align="left" valign="top"|Selectivity (Ti etch rate/ZEP etch rate) | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*At least 1:1 | *At least 1:1 | ||