Specific Process Knowledge/Etch/Etching of Silicon Nitride: Difference between revisions
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*60-65 nm/min has been tested | |||
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Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits |
Bghe (talk | contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators 7,318 edits |
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*Process dependent | *Process dependent | ||
*60-65 nm/min has been tested | |||
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