Specific Process Knowledge/Etch/Etching of Silicon Nitride: Difference between revisions
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*[[Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Silicon Nitride Etch using AOE|Etch of Silicon Nitride using AOE]] | *[[Specific Process Knowledge/Etch/AOE (Advanced Oxide Etch)/Silicon Nitride Etch using AOE|Etch of Silicon Nitride using AOE]] | ||
*[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/Ion Beam Etching using IBSD Ionfab 300]] | *[[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/Ion Beam Etching using IBSD Ionfab 300]] | ||
*[[Specific_Process_Knowledge/Etch/ICP_Metal_Etcher/silicon_nitride|Silicon nitride etch using the ICP metal]] | |||
==Compare the methods for Silicon Nitride etching== | ==Compare the methods for Silicon Nitride etching== | ||