Specific Process Knowledge/Etch/Etching of Silicon/Si etch using ASE: Difference between revisions
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===Iso=== | ===Iso=== | ||
The same recipe as Deepetch but without the passivation steps. <br> | The recipe Iso is the same recipe as Deepetch but without the passivation steps. <br> | ||
It has been tested once by Filip Sandborg-Olsen @nanotech. <br> | It has been tested once by Filip Sandborg-Olsen @nanotech. <br> | ||
He etched with 100% load for 10min. He got an etch rate of 5.51µm/min | He etched with 100% load for 10min. He got an etch rate of 5.51µm/min | ||