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Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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!Comments
!Comments
|-
|-


|-
|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|Silicon with native oxide
|1,415
|1,367
|3,7%
|3,1%
|1/4 2015
|10/7 2015
|chasil
|chasil
|with HMDS. Average of 3 wafers
|with HMDS. Average of 3 wafers




Line 269: Line 268:
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
|Silicon with native oxide
|Silicon with native oxide
|1,367
|1,409
|3,1%
|2,4%
|10/7 2015
|12/15 2015
|chasil
|chasil
|with HMDS. Average of 3 wafers
|with HMDS. Average of 3 wafers
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