Specific Process Knowledge/Thermal Process/Dope with Boron: Difference between revisions
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The SIMS measurement shows a good uniformity | The SIMS measurement shows a good uniformity | ||
[[image:Boron_doping_profiles-w1.jpg|500x600px|left|thumb|SIMS Measurement at 4 different positions after Pre-deposition of boron]][[image:Waferlayout.jpg | [[image:Boron_doping_profiles-w1.jpg|500x600px|left|thumb|SIMS Measurement at 4 different positions after Pre-deposition of boron]][[image:Waferlayout.jpg|thumb|Sample position on the wafer]] | ||
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