Specific Process Knowledge/Thermal Process/Dope with Boron: Difference between revisions

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	[[image:Boron_doping_profiles-w1.jpg\|500x600px\|left\|thumb\|SIMS Measurement at 4 different positions after Pre-deposition of boron]]		[[image:Boron_doping_profiles-w1.jpg\|500x600px\|left\|thumb\|SIMS Measurement at 4 different positions after Pre-deposition of boron]]\|\|[[image:Waferlayout.jpg\|500x600px\|right\|thumb\|Sample position on the wafer]]

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