Specific Process Knowledge/Doping: Difference between revisions
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== Doping your wafer == | == Doping your wafer == | ||
This page is about doping your wafer or making a thin film layer doped with boron, phosphorous or | This page is about doping your wafer or making a thin film layer doped with boron, phosphorous or germanium. The links below direct you to various doping results achieved by the use of different processes and heat treatments. | ||
*[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Doping with Phosphorous using high temperature furnaces]] - Doping silicon wafers with phosphorous by thermal pre-deposition and drive-in | *[[Specific Process Knowledge/Thermal Process/Dope with Phosphorus|Doping with Phosphorous using high temperature furnaces]] - Doping silicon wafers with phosphorous by thermal pre-deposition and drive-in | ||
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*[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si|Doping using LPCVD PolySilicon Furnaces]] - Deposition of Poly-Si or amorphous Si doped with boron or phosphorous | *[[Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon/Boron doped poly-Si and a-Si|Doping using LPCVD PolySilicon Furnaces]] - Deposition of Poly-Si or amorphous Si doped with boron or phosphorous | ||
*[[Specific Process Knowledge/Thin film deposition/PECVD/Doping|Doping using PECVD]] - Making boron glass (BSG), phosphorous glass (PSG), boron-phosphorous glass PBSG or germanium doped glass | *[[Specific Process Knowledge/Thin film deposition/PECVD/Doping|Doping using PECVD]] - Making boron glass (BSG), phosphorous glass (PSG), boron-phosphorous glass PBSG or germanium doped glass | ||
*Ion implantation | *Ion implantation (not possible at Danchip) | ||
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