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Specific Process Knowledge/Thin film deposition/PECVD/Doping: Difference between revisions

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==Boron-doping by use of BSG glass deposited in PECVD2==
==Boron-doping by use of BSG glass deposited in PECVD2==
''Results from Joachim Dahl Thomsen, Nanotech, 2014''


===Recipe===
===Recipe===
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==Boron-doping by use of BSG glass deposited in PECVD2==
==Boron-doping by use of BSG glass deposited in PECVD2==


''Results from Tine Holm Christensen, DTU-Space, Feb. 2015''
''Results from Trine Holm Christensen, Space, Feb. 2015''


===Recipe===
===Recipe===
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'''Anneal in Furnace (C1):''' ANN950, 60 min in N<sub>2</sub>
'''Anneal in Furnace (C1):''' ANN950, 60 min in N<sub>2</sub>


The wafers were then analyzed by SIMS and the results are shown in the figure below:
The wafers were then analyzed by SIMS and the results are shown in the figure below:
 
[[image:PECVD_Boron_doping_profiles.jpg|627x424px|left|thumb|Boron concentration measured by SIMS. Results from Trine Holm Christensen, Space, Feb. 2015.]]
 
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