Specific Process Knowledge/Thin film deposition/PECVD/Doping: Difference between revisions

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=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=
=<span style="background:#FF2800">THIS PAGE IS UNDER CONSTRUCTION</span>[[image:Under_construction.png|200px]]=


===Recipes===
===Recipe===
{| border="1" cellspacing="0" cellpadding="7"
{| border="1" cellspacing="0" cellpadding="7"
|-
|-
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|N2 flow [sccm]
|N2 flow [sccm]
|B2H6 flow [sccm]
|B2H6 flow [sccm]
|PH3 flow [sccm]
|Pressure [mTorr]
|Pressure [mTorr]
|Power [W]
|Power [W]
|Description
|Description
|-  
|-  
|LFSiO
|12
|1420
|392
|0
|0
|550
|60
|Uniform silicon oxide
|-
|1PBSG
|1PBSG
|17
|17
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|0
|0
|135
|135
|40
|500
|500
|800LF
|800LF
|BPSG glass for waveguide cladding layer
|BPSG glass for drive in boron in Silcion
|}
|}
LF=Low Frequency

Revision as of 09:43, 1 December 2015

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Recipe

Recipe name SiH4 flow [sccm] N2O flow [sccm] N2 flow [sccm] B2H6 flow [sccm] Pressure [mTorr] Power [W] Description
1PBSG 17 1600 0 135 500 800LF BPSG glass for drive in boron in Silcion