Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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{| border="2" cellspacing="0" cellpadding="10" width="60%" | {| border="2" cellspacing="0" cellpadding="10" width="60%" | ||
| | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
!style="background:silver; color:black;" align="left"|Purpose | !style="background:silver; color:black;" align="left"|Purpose | ||
|style="background:LightGrey; color:black"|pattern an electron sensitive resist | |style="background:LightGrey; color:black"|pattern an electron sensitive resist | ||