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Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions

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Bureaucrats, danchip, Administrators
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BGE (talk | contribs)
Bureaucrats, danchip, Administrators
2,908 edits
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|'''Chemical solution'''
|'''Chemical solution'''
|H<math>_2</math>O, NH<math>_4</math>OH and H<math>_2</math>O<math>(29%)_2</math>(30%) (5:1:1)
|H<math>_2</math>O, NH<math>_4</math>OH(29%) and H<math>_2</math>O<math>_2</math>(30%) (5:1:1)
|H<math>_2</math>0, HCl(37%) and H<math>_2</math>O<math>_2</math>(30%) (5:1:1)
|H<math>_2</math>O, HCl(37%) and H<math>_2</math>O<math>_2</math>(30%) (5:1:1)
|5% HF
|5% HF
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