Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions
Appearance
No edit summary |
|||
| Line 22: | Line 22: | ||
{| border="2" cellspacing="0" cellpadding="4" align="left" width="570pt" | {| border="2" cellspacing="0" cellpadding="4" align="left" width="570pt" | ||
! | ! | ||
! | ! RCA1 | ||
! | ! RCA2 | ||
! HF | |||
|- | |- | ||
|'''General description''' | |'''General description''' | ||
| Line 30: | Line 31: | ||
| | | | ||
Cleaning of wafers using a beaker in the fumehood in cleanroom 2. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers. | Cleaning of wafers using a beaker in the fumehood in cleanroom 2. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers. | ||
| | |||
|- | |- | ||
|'''Chemical solution''' | |'''Chemical solution''' | ||