Jump to content

Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions

BGE (talk | contribs)
No edit summary
BGE (talk | contribs)
Line 22: Line 22:
{| border="2" cellspacing="0" cellpadding="4" align="left" width="570pt"
{| border="2" cellspacing="0" cellpadding="4" align="left" width="570pt"
!  
!  
! 7-up
! RCA1
! Piranha
! RCA2
! HF
|-  
|-  
|'''General description'''
|'''General description'''
Line 30: Line 31:
|
|
Cleaning of wafers using a beaker in the fumehood in cleanroom 2. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers.
Cleaning of wafers using a beaker in the fumehood in cleanroom 2. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers.
|
|-
|-
|'''Chemical solution'''
|'''Chemical solution'''