Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions

@@ Line 114: / Line 114: @@
 |style="background:LightGrey; color:black"|Batch size
 |style="background:WhiteSmoke; color:black"|
+*1-3 4" wafer per run
+*1 6" wafer per run
+*Or several smaller pieces
+*Deposition on one side of the substrate
+|
 *One 4" wafer per run
 *One 6" wafer per run
-*Or several smaler pieces on carrier wafer
+*Or several smaller pieces on carrier wafer
 *Deposition on one side of the substrate
-|
-*1-3 4" wafer per run
-*1 6" wafer per run
-*Or several smaler pieces
-*Deposition on one side of the substrate
 |-
 | style="background:LightGrey; color:black"|Materials allowed