Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
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|- | |- | ||
|NiV 93/7%|| 0,250"|| 99,95% | |NiV 93/7%|| 0,250"|| 99,95% | ||
|- | |||
|SiC || 0,125" + Cu backing plate|| 99,5% | |||
|- | |- | ||
|Si3N4/MgO 2%|| 0,125"|| 99,9% | |Si3N4/MgO 2%|| 0,125"|| 99,9% | ||
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|ZrO(2)/Y(2)O(3)|| || 99,900% | |ZrO(2)/Y(2)O(3)|| || 99,900% | ||
|} | |} | ||
==Relative Sputter rates== | ==Relative Sputter rates== | ||
To use these charts, locate the material for which known conditions are available. Then | To use these charts, locate the material for which known conditions are available. Then | ||