Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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* AZ5214E 1-4,2 µm | * AZ5214E 1-4,2 µm | ||
* | * AZ4562 6,2-25 µm | ||
* E-beam | * E-beam resists 0,1-1 µm | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | ||