Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions
| Line 278: | Line 278: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Silicon with native oxide | |Silicon with native oxide | ||
|1.559 | |1.559 µm | ||
|0.4% | |0.4% | ||
|27/3 2015 | |27/3 2015 | ||
| Line 286: | Line 286: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Silicon with native oxide | |Silicon with native oxide | ||
|1.572 | |1.572 µm | ||
|0.8% | |0.8% | ||
|4/11 2015 | |4/11 2015 | ||
| Line 330: | Line 330: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Silicon with native oxide | |Silicon with native oxide | ||
|2.064 | |2.064 µm | ||
|0.8% | |0.8% | ||
|4/11 2015 | |4/11 2015 | ||
| Line 366: | Line 366: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Silicon with native oxide | |Silicon with native oxide | ||
|4.131 | |4.131 µm | ||
|0.5% | |0.5% | ||
|4/11 2015 | |4/11 2015 | ||