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| '''The user manual, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=122 Hotplate 1 (SU8)] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=124 Hotplate 2 (SU8)]''' | | '''The user manual, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=122 Hotplate 1 (SU8)] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=124 Hotplate 2 (SU8)]''' |
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| ==Fume hood hotplates==
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| This section is under construction [[Image:section under construction.jpg|70px]]
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| Variable temperature hotplate mostly used for baking of single wafers as a soft baking step after a spin coating of photoresist on the associated spin coater.
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| <gallery caption="Fumehood hotplates" widths="300px" heights="250px" perrow="4">
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| image:FumehoodHotplate in C-1.jpg|Fume hood hotplate for '''[[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_.28Polymers.29|Manual Spinner (Polymers)]]''' located in the fume hood in C-1. Limited to 300°C.
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| image:FumehoodHotplate in E-5.jpg|Fume hood hotplate for [[Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_1|'''Manual Spinner 1''']] located in the fume hood in E-5. Limited to 210°C.
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| image:FumehoodHotplate Si in A-5.jpg|Fume hood hotplate (Si) for [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|'''Spin coater: Manual Labspin''']] located in the fume hood in A-5. Limited to 220°C.
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| image:FumehoodHotplate III-V in A-5.jpg|Fume hood hotplate (III-V) for [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|'''Spin coater: Manual Labspin''']] located in the fume hood in A-5. Right: High temperature; limited to 280°C. Left: Low temperature; limited to 125°C.
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| </gallery>
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