Specific Process Knowledge/Thin film deposition/Lesker: Difference between revisions
| Line 43: | Line 43: | ||
====Thickness uniformity==== | ====Thickness uniformity==== | ||
We have measured the thickness of a TiO<sub>x</sub> film deposited on a 6" si wafer. | We have measured the thickness of a TiO<sub>x</sub> film deposited on a 6" si wafer. | ||
[[File:TiO2_150mm_13_points_from_lesker_20151103.png|500px|right]] | |||
Deposition parameters were: | Deposition parameters were: | ||
{| border="2" cellspacing="0" cellpadding="10" | {| border="2" cellspacing="0" cellpadding="10" | ||
|- | |- | ||
| Line 55: | Line 55: | ||
|- | |- | ||
!style="background:silver; color:black;" align="left"|Gas | !style="background:silver; color:black;" align="left"|Gas | ||
|style="background:WhiteSmoke; color:black"|O<sub>2</sub>/Ar Ratio 100 | |style="background:WhiteSmoke; color:black"|O<sub>2</sub>/Ar Ratio 10/100 | ||
|- | |- | ||
!style="background:silver; color:black;" align="left"|Pressure | !style="background:silver; color:black;" align="left"|Pressure | ||