Specific Process Knowledge/Characterization/SEM LEO: Difference between revisions
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[[image: | [[image:IMG_3290.jpg|400x400px|right|thumb|Picosun R200 ALD, positioned in cleanroom F-2.]] | ||
A Danchip there are five scanning electron microscopes (SEMs). These SEMs cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | A Danchip there are five scanning electron microscopes (SEMs). These SEMs cover a wide range of needs both in the cleanroom and outside: From the fast in-process verification of different process parameters such as etch rates, step coverages or lift-off quality to the ultra high resolution images on any type of sample intended for publication. | ||