Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions

@@ Line 183: / Line 183: @@
-|-
-|-style="background:WhiteSmoke; color:black"
-|'''ZEP7000'''
-|Positive
-|ZEON
-|Not approved. Low dose to clear, can be used for trilayer (PEC-free) resist-stack. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
-|[[media:ZEP7000.pdf|ZEP7000.pdf]]
-|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
-|
-|ZED-500/Hexyl Acetate,n-amyl acetate, oxylene.
-|IPA
-|acetone/1165
-|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx‎|Process_Flow_Trilayer_Ebeam_Resist.docx‎]]
@@ Line 298: / Line 285: @@
 |acetone/1165/Pirahna
 |
+|-
+|-style="background:WhiteSmoke; color:black"
+|'''ZEP7000'''
+|Positive
+|ZEON
+|Not approved. Low dose to clear, can be used for trilayer (PEC-free) resist-stack. Please contact [mailto:Lithography@danchip.dtu.dk Lithography] for information.
+|[[media:ZEP7000.pdf|ZEP7000.pdf]]
+|[[Specific_Process_Knowledge/Lithography/Coaters#Manual Spinner 1|Manual Spinner 1 (Laurell)]], [[Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_Labspin|Spin Coater Labspin]]
+|
+|ZED-500/Hexyl Acetate,n-amyl acetate, oxylene.
+|IPA
+|acetone/1165
+|Trilayer stack: [[media:Process_Flow_Trilayer_Ebeam_Resist.docx‎|Process_Flow_Trilayer_Ebeam_Resist.docx‎]]
 |}