Specific Process Knowledge/Thin film deposition/Deposition of Aluminium Nitride: Difference between revisions
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== Deposition of Aluminium Nitride == | == Deposition of Aluminium Nitride == | ||
AlN can be deposited by using sputtering method with AlN target or reactive sputtering method with Al target in mixtures of argon and nitrogen. | |||
*[[/AlN in PVD co-sputter|Al<sub>x</sub>N<sub>y</sub> in PVD co-sputter/evaporation]] <br/> | *[[/AlN in PVD co-sputter|Al<sub>x</sub>N<sub>y</sub> in PVD co-sputter/evaporation]] <br/> | ||