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Specific Process Knowledge/Thin film deposition/Deposition of Aluminium Nitride: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
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Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
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!Generel description
!Generel description
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*Reactive Co-Sputtering
*Reactive Sputtering (Al target)
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