Jump to content

Specific Process Knowledge/Thin film deposition/Deposition of Aluminium Nitride: Difference between revisions

← Older editNewer edit →
VisualWikitext
Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
Paphol (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers
912 edits
Line 10: Line 10:
Write a short description of the process and how to perform the process.
Write a short description of the process and how to perform the process.


*[[/MgB in PVD co-sputter|MgB in PVD co-sputter/evaporation]]
*[[Specific Process Knowledge/Thin film deposition/Deposition of AlxNy|Al<sub>x</sub>N<sub>y</sub> in PVD co-sputter/evaporation]] <br/>
<!-- Link to the process info page in LabAdviser -->
 




Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Thin_film_deposition/Deposition_of_Aluminium_Nitride"