Specific Process Knowledge/Lithography/EBeamLithography/FilePreparation: Difference between revisions
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== Calibration during writing (PATH)== | == Calibration during writing (PATH)== | ||
<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Lithography/EBeamLithography/FilePreparation#top|Go to top of this page]]</span> | |||
The inital and cyclic calibration before and during an e-beam run is defined in the jdf-file, e.g. by 'PATH DRF5M'. | The inital and cyclic calibration before and during an e-beam run is defined in the jdf-file, e.g. by 'PATH DRF5M'. | ||
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</pre> | </pre> | ||
== Alignment and global mark detection == | == Alignment and global mark detection == | ||