Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres: Difference between revisions
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<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/2highres#top|Go to top of this page]]</span> | <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/2highres#top|Go to top of this page]]</span> | ||
What looks good in one spectrum, however, may not necessarily look good in another. Click the 'Open Experiment/Instrument And Properties View' button to remove the properties view and enlarge the 'Peak Fit' table. Now scroll through the different levels and notice how the peaks dance back and forth in the spectrum. | What looks good in one spectrum, however, may not necessarily look good in another. Click the 'Open Experiment/Instrument And Properties View' button to remove the properties view and enlarge the 'Peak Fit' table. Now scroll through the different etch levels and notice how the peaks dance back and forth in the spectrum. | ||
[[File:XPS-basics16.jpg|700px]] | [[File:XPS-basics16.jpg|700px]] | ||
In the spectrum above ( | In the spectrum above (Etch level 0), the two doublets slided apart. With only background signal to adjust to, the fitting routine found a minimum with peaks in each end of the spectrum. Below, with a large and pure bulk Si2p spectrum at etch level 48, the doublets lie on top of each other. | ||
[[File:XPS-basics17.jpg|700px]] | [[File:XPS-basics17.jpg|700px]] | ||
This fitting is clearly wrong and we need to apply some constraints on some of the parameters. Scroll back to | This fitting is clearly wrong and we need to apply some constraints on some of the parameters. Scroll back to an etch level where all peaks are visible, in this case etch level 35, see image [[#anchor_level35|above]]. | ||
== Change fitting constraints == | == Change fitting constraints == | ||