Specific Process Knowledge/Characterization/XPS/Processing/Basics/2highres: Difference between revisions
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Scroll up or down through the etch levels of one spectrum by using the scroll button (either etch level or etch time). If several spectra are selected simultaneously by pressing SHIFT or CTRL while clicking on the spectra in the four quadrant view, you watch the evolution of the spectra together. | Scroll up or down through the etch levels of one spectrum by using the scroll button (either etch level or etch time). If several spectra are selected simultaneously by pressing SHIFT or CTRL while clicking on the spectra in the four quadrant view, you watch the evolution of the spectra together. | ||
To analyze a single spectrum, select and maximize it. Before adding peaks to the spectrum, it is a good idea consider what you know about the sample. Here, we know that the sample has ALD deposited layers of ZnO and CuZn on top of a silicon substrate. One would therefore expect to see bulk silicon provided we sputter deep enough and oxidized silicon from the native oxide. Therefore, scroll to an etch level where, preferably, both the oxidized Si2p and the bulk silicon Si2p are visible. In this case, it is level 35. | To analyze a single spectrum, select and maximize it. Before adding peaks to the spectrum, it is a good idea consider what you know about the sample. Here, we know that the sample has ALD deposited layers of ZnO and CuZn on top of a silicon substrate. One would therefore expect to see bulk silicon provided we sputter deep enough and oxidized silicon from the native oxide. Therefore, scroll to an etch level where, preferably, both the oxidized Si2p and the bulk silicon Si2p are visible. In this case, it is etch level 35. | ||
<gallery widths="350" heights="250" perrow="3"> | <gallery widths="350" heights="250" perrow="3"> | ||
Image:XPS-basics11a.jpg | | Image:XPS-basics11a.jpg | Etch level 34: The oxide peak is barely visible. | ||
Image:XPS-basics11b.jpg | | Image:XPS-basics11b.jpg | Etch level 35: Both the oxide and the bulk peak are visible and clearly separated. | ||
Image:XPS-basics11c.jpg | | Image:XPS-basics11c.jpg | Etch level 36: The separation between the peaks is less visible. | ||
</gallery> | </gallery> | ||