Specific Process Knowledge/Characterization/XPS/Processing/Basics/1intro: Difference between revisions
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<span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro#top|Go to top of this page]]</span> | <span style="font-size: 90%; text-align: right;">[[Specific_Process_Knowledge/Characterization/XPS/Processing/Basics/1intro#top|Go to top of this page]]</span> | ||
To add the peaks that are not present in current level (for copper and silicon), click 'Manual Peak ID' as shown below. A window called 'Manual Peak ID' opens - here select Cu and Si. | To add the peaks that are not present in current etch level (for copper and silicon), click 'Manual Peak ID' as shown below. A window called 'Manual Peak ID' opens - here select Cu and Si. | ||
[[File:XPS-basics06d.jpg|700px]] | [[File:XPS-basics06d.jpg|700px]] | ||