Jump to content

Specific Process Knowledge/Lithography/Coaters/Spin Coater: Gamma UV processing: Difference between revisions

← Older editNewer edit →
VisualWikitext
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Taran (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, NLAB-Nlab307-labadviser-users-34891
3,527 edits
Line 430: Line 430:


''Sequence names, process parameters, and test results (Sequence no. 4000-4999):''
''Sequence names, process parameters, and test results (Sequence no. 4000-4999):''
*'''(4460) DCH 100mm 4562 6.2um'''
*'''(4400) DCH 100mm 4562 6.2um'''
*'''(4660) DCH 150mm 4562 6.2um'''
*'''(4600) DCH 150mm 4562 6.2um'''
Spin-off: 5165 rpm. Soft bake: 100s.
Spin-off: 5165 rpm. Soft bake: 100s.


Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Lithography/Coaters/Spin_Coater:_Gamma_UV_processing"