Specific Process Knowledge/Lithography/Coaters: Difference between revisions
Appearance
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|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater:_RCD8|Spin Coater: RCD8]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters# | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater: Manual_All_Resists|Spin_Coater:Manual All Resists]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters# | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin_Coater: Manual_Standard_Resists|Spin_Coater:Manual Standard Resists]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin coater: | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin coater: Manual_Laurell|Spin coater: Manual Laurell]]</b> | ||
|style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]]</b> | |style="background:WhiteSmoke; color:black"|<b>[[Specific_Process_Knowledge/Lithography/Coaters/SprayCoater|Spray Coater]]</b> | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Coating of all resists | *Coating of all resists | ||
|style="background:WhiteSmoke; color:black"| | |||
*Coating of | |||
** CSAR | |||
** ZEP | |||
** HSQ (FOx) | |||
**AZ 5214E resist | |||
**AZ 4562 resist | |||
**AZ MiR resist | |||
**AZ nLOF resist | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Coating of all resist | *Coating of all resist | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Spraying imprint resist | *Spraying imprint resist | ||
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|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Cassette-to-cassette | * Cassette-to-cassette | ||
|colspan=" | |style="background:WhiteSmoke; color:black"| | ||
* Single substrate | |||
* Edge handling chuck | |||
|colspan="2" align="center" style="background:WhiteSmoke; color:black"|Single substrate | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* Can handle almost any sample size and shape | * Can handle almost any sample size and shape | ||
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* PGMEA for backside rinse and edge-bead removal | * PGMEA for backside rinse and edge-bead removal | ||
* PGMEA for spinner bowl cleaning and vapor tip bath | * PGMEA for spinner bowl cleaning and vapor tip bath | ||
|colspan="3" rowspan="2" align="center"|Only manual dispense | |colspan="3" rowspan="2" align="center" style="background:WhiteSmoke; color:black"|Only manual dispense | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* No permanent media | * No permanent media | ||
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*no | *no | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
* | *no | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*no | *no | ||
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*100 mm wafers | *100 mm wafers | ||
*150 mm wafers | *150 mm wafers | ||
*small pieces down to 10x10 mm2 | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*50 mm wafers | *50 mm wafers | ||
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*Silicon | *Silicon | ||
*Glass | *Glass | ||
|style="background:WhiteSmoke; color:black"| | |||
*III-V materials | |||
*Si, SiO2, SOI | |||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*All cleanroom materials | *All cleanroom materials | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*All cleanroom materials | *All cleanroom materials | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*All chemicals to be spray coated must be approved specifically for spray coating | *All chemicals to be spray coated must be approved specifically for spray coating | ||