Specific Process Knowledge/Characterization: Difference between revisions
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== Choose equipment == | == Choose equipment == | ||
SEM's at CEN | '''SEM's at CEN''' | ||
*[[/SEM FEI QUANTA 200 3D|FIB-SEM FEI QUANTA 200 3D]] | *[[/SEM FEI QUANTA 200 3D|FIB-SEM FEI QUANTA 200 3D]] | ||
*[[/Dual Beam FEI Helios Nanolab 600|Dual Beam FEI Helios Nanolab 600]] | *[[/Dual Beam FEI Helios Nanolab 600|Dual Beam FEI Helios Nanolab 600]] | ||
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*[[/SEM FEI Quanta 200 ESEM FEG|SEM FEI Quanta 200 ESEM FEG]] | *[[/SEM FEI Quanta 200 ESEM FEG|SEM FEI Quanta 200 ESEM FEG]] | ||
*[[/SEM Inspect S|SEM Inspect S]] | *[[/SEM Inspect S|SEM Inspect S]] | ||
SEM's at Danchip | '''SEM's at Danchip''' | ||
*[[/SEM: Scanning Electron Microscopy |SEM LEO]] | *[[/SEM: Scanning Electron Microscopy |SEM LEO]] | ||
*[[/SEM: Scanning Electron Microscopy |SEM JEOL]] | *[[/SEM: Scanning Electron Microscopy |SEM JEOL]] | ||
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*[[/SEM: Scanning Electron Microscopy |SEM Supra 3]] | *[[/SEM: Scanning Electron Microscopy |SEM Supra 3]] | ||
'''AFM''' | |||
*[[/AFM: Atomic Force Microscopy|AFM - ''Atomic Force Microscopy'']] | *[[/AFM: Atomic Force Microscopy|AFM - ''Atomic Force Microscopy'']] | ||
Optical and stylus profilers | '''Optical and stylus profilers''' | ||
*[[/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | *[[/Profiler#Optical_Profiler_(Sensofar)|Optical Profiler (Sensofar)]] | ||
*[[/Profiler#Dektak XTA_new stylus profiler|Dektak XTA_new]] | *[[/Profiler#Dektak XTA_new stylus profiler|Dektak XTA_new]] | ||
*[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | *[[/Profiler#Dektak _8 stylus _profiler|Dektak 8 stylus profiler]] | ||
*[[/Profiler#Dektak_III-V_Profiler|III V Profiler]] | *[[/Profiler#Dektak_III-V_Profiler|III V Profiler]] | ||
'''Optical microscopes''' | |||
*[[/Optical microscope|Optical microscope]] | *[[/Optical microscope|Optical microscope]] | ||
Optical characterization | Optical characterization | ||
Revision as of 19:56, 7 September 2015
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Choose characterization topic
- Element analysis
- Measurement of film thickness and optical constants
- Photoluminescence mapping
- Sample imaging
- Sample preparation for inspection
- Stress measurement
- Wafer thickness measurement
- Topographic measurement
- Contact angle measurement
- Four-Point_Probe (Resistivity measurement)
- Carrier density (doping) profiler
- Scanning Electron Microscopy
Choose equipment
SEM's at CEN
- FIB-SEM FEI QUANTA 200 3D
- Dual Beam FEI Helios Nanolab 600
- SEM FEI Nova 600 NanoSEM
- SEM FEI Quanta 200 ESEM FEG
- SEM Inspect S
SEM's at Danchip
AFM
Optical and stylus profilers
Optical microscopes
Optical characterization
Element analysis