Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD: Difference between revisions
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For Si wafers, amorphous TiO<sub>2</sub> is best grown on wafers with native oxide, and anatase TiO<sub>2</sub> is best grown on wafers without native oxide (removed using HF). | For Si wafers, amorphous TiO<sub>2</sub> is best grown on wafers with native oxide, and anatase TiO<sub>2</sub> is best grown on wafers without native oxide (removed using HF). | ||
====TiO<sub>2</sub> standard recipe==== | ====TiO<sub>2</sub> standard recipe==== | ||
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====TiO<sub>2</sub> deposition rates==== | ====TiO<sub>2</sub> deposition rates==== | ||
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Evgeniy Shkondin, DTU Danchip, April-May 2014. | Evgeniy Shkondin, DTU Danchip, April-May 2014. | ||
====TiO<sub>2</sub> results==== | ====TiO<sub>2</sub> results==== | ||
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Evgeniy Shkondin, DTU Danchip, 2014. | Evgeniy Shkondin, DTU Danchip, 2014. | ||
====TiO<sub>2</sub> deposition on trenches==== | ====TiO<sub>2</sub> deposition on trenches==== | ||