Specific Process Knowledge/Thin film deposition/ALD Picosun R200: Difference between revisions
| Line 38: | Line 38: | ||
*[[Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD|Al<sub>2</sub>O<sub>3</sub> deposition using ALD]] | *[[Specific Process Knowledge/Thin Film deposition/ALD/Al2O3 deposition using ALD|Al<sub>2</sub>O<sub>3</sub> deposition using ALD]] | ||
*[[Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD|TiO<sub>2</sub> deposition using ALD]] | *[[Specific Process Knowledge/Thin Film deposition/ALD/TiO2 deposition using ALD|TiO<sub>2</sub> deposition using ALD]] | ||
*[[/TiO2 deposition using ALD|Standard recipes on the ALD tool|Standard recipes on the ALD tool]] | |||
*[[/TiO2 deposition using ALD|Results from the ALD acceptance test|Results from the ALD acceptance test]] | |||
*[[/TiO2 deposition using ALD|Al2O3 deposition using ALD|Al<sub>2</sub>O<sub>3</sub> deposition using ALD]] | |||
*[[/TiO2 deposition using ALD|TiO<sub>2</sub> deposition using ALD]] | *[[/TiO2 deposition using ALD|TiO<sub>2</sub> deposition using ALD]] | ||